Patents - Thin Films
| WO 2005/038891 A1 (04/28/05) JSR Corporation
"Matsuki, Y.; Wang, D.; Sakai, T.; Iwasawa, H."
"COMPOSITION FOR FORMING SILICON-COBALT FILM, SILICON-COBALT FILM AND METHOD FOR FORMING SAME"
"A composition for forming a silicon-cobalt film at low production cost without requiring an expensive vacuum apparatus or high-frequency wave generating apparatus, contains a silicon compound and a cobalt compound and is applied to a base and treated with heat or light."
| WO 2004/046417 A3 (03/10/05) President And Fellows Of Harvard College
"Gordon, R. G.; Booyong, S."
ATOMIC LAYER DEPOSITION USING METAL AMIDINATES
Published as A2 (06/03/04)